culture   United States
statement   Thin film vacuum deposition is commonly used in high-tech industries in the United States for manufacturing electronic and semiconductor components.

4 similar statements
# Concept Culture Statement Freq.
1 thin film vacuum deposition United States Commonly used in high-tech industries for manufacturing electronic and optical devices. 1
2 thin film vacuum deposition United States Commonly used in manufacturing semiconductors and electronic components 1
3 thin film vacuum deposition United States Commonly used in high-tech industries for manufacturing electronic components and coatings. 1
4 thin film vacuum deposition United States Commonly used in semiconductor manufacturing and research and development industries. 1